The intuitive user interface allows measurements to be made quickly and easily.
#Process monitor remote computer manual#
A choice of manual or auto-control of all system components is provided.ĭata is measured and displayed using the UGAPM software. The UGAPM system can be controlled from the front-panel or from a computer. The other is the multi-range configuration, which may be applied for various ranges of the sample pressure. One is the multichannel configuration, which may be applied for one specific sample pressure at various places. The software also allows remote control of the system's valves, heaters and pumps.Īn optional multiple inlet valve is available with two possible configurations. The UGAPM Windows software provides a graphical user interface for complex graphing and data analysis. After the pressure is reduced to around 10 -6 Torr, the gas stream is sent to a mass spectrometer (residual gas analyzer-RGA) which measures the concentration of each mass of interest.
The UGAPM system uses a single stage capillary pressure reducing inlet to sample gases from 1 mTorr to 20 Torr. With this configuration, there is almost zero dead volume between the process chamber and the analyzer.
In UGAPM systems, a SS capillary of 1/16” or 1/8” OD is used to accommodate mid-vacuum sampling. All the components can be controlled from the front-panel or a remote computer. These analyzers are also simple to operate and maintain. UGAPM applications include CVD/PECVD/RIE/LPCVD/MOCVD, vacuum coating/ plasma etching, evaporation, sputter deposition, vacuum heat treatment, target burn-in, leak detection/ virtual leaks/ desorption, contamination studies, small volume analysis (0.1 mL range), etc. The inlet continuously samples gases at low flow rates (about 5x10 -5 mbar L/sec) making the instrument ideal for on-line analysis. The UGAPM Series Process Monitoring Systems are modern mass spectrometers designed for the analysis of process gases.
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